Dr. Senad Bulja, PhD, FIET, SMIEEE

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Home » Researches » Electro-chromic structure with a high degree of dielectric tunability

Electro-chromic structure with a high degree of dielectric tunability

Dr. Senad Bulja 04/01/2023Download PDF

 

In our previous papers on Electro-Chromic (EC) materials, we have shown that standard inorganic EC structures in the form of EC film/electrolyte/Ion storage films (such as WO3/LiNbO3/NiO), in addition to possessing reconfigurable optical properties also exhibit a degree of electric field induce dielectric tunability at radio frequencies. The extent of dielectric tunability in those standard EC structures is commensurate with the tunability exhibited by more mature bulk-tuneable technologies, such as Liquid Crystals (LCs), being between 5% and 20% depending on the frequency of operation, the thickness of the individual EC layers (EC films, electrolyte and ion tank).

In the present paper, we report on a new, inorganic EC structure capable of achieving a high degree of dielectric tunability. In particular, this new structure has the same chemical composition as our previously examined EC structures, however, its constituent layers are perturbed: the EC film (WO3) is placed in the interior of the device, while the electrolyte (LiNbO3) is placed at the periphery of the cell, as shown in Fig. 1. The new structure, termed LiNbO3/WO3/LiNbO3, is capable of no less than three times higher dielectric tunability compared to the standard EC cell structure, WO3/LiNbO3/NiO, standing up to 65%, in the same frequency range, up to 20 GHz. 

These are very important results as they point to new ways of increasing dielectric tunability, which will be useful in the enablement of flexible spectrum usage of new communications technologies, such as 6G. 

Fig. 1 Structure of new, high dielectric tunability EC cell

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Profile & Bio

Senad Bulja, Ph.D., FIET, SMIEEE 

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PROFESSIONAL Profile

  • Accomplished career of over 19 years demonstrating consistent success as a Researcher, Leader and Mentor in the Wireless industry research environment.
  • Excellent Scientific contributions in the field of RF, EMC and telecommunications with 4 Nature Journal publications and over 70 peer-reviewed articles and conference papers
  • Strong leadership skills demonstrated by leading Ph.D. level educated cross-continental and cross-departmental teams to successful project execution.  
  • Proven Strategic Business Impact – introduced own developed technology into Nokia’s future technology roadmap (RF filters) and business transfer of the smart surface technology. 
  • Creative, internationally awarded and well-driven inventor with over 70 filed patents in the area of hardware for Radio Frequency (RF), Wireless Sensor Networks (WSN), Internet of Things (IoT) and wireless systems architectures. E.g. Nokia patent award entitled: “A top inventor in implementation patent first filings”, 2020.
  • Significant contribution in the identification of high revenue IP assets and leadership on the creation of Nokia’s patent portfolio roadmap. 
 

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